Metal Oxide Buffer Layer Thickness Influence on the Performance of Pentacene Thin Film Transistors

Sun, Zhe and Peng, Wei and Chen, Yaya and Hu, Wei (2013) Metal Oxide Buffer Layer Thickness Influence on the Performance of Pentacene Thin Film Transistors. Physical Science International Journal, 4 (1). pp. 51-57.

[thumbnail of Hu412013PRRI5089.pdf] Text
Hu412013PRRI5089.pdf - Published Version

Download (1MB)

Abstract

High performance top contact organic thin-film transistors (TC OTFTs) with bilayer electrodes (MoO3/Au) are fabricated. The interface properties of metal electrodes with organic active layer have an important effect on the OTFTs performance. We demonstrate the MoO3 layer is working as a buffer layer which can lower the charge injection barrier and reduce the contact resistance, and study the devices characteristics changing with the buffer layer thickness. Comparing with conventional TC OTFTs, the organic transistor with 10nm buffer layer shows the highest performance with field-effect mobility increasing from 0.17 to 0.69 cm2/V·s, threshold voltage downshifts from –13 to –5.3 V, and the on/off current ratio is about 50 times higher.

Item Type: Article
Subjects: Middle Asian Archive > Physics and Astronomy
Depositing User: Managing Editor
Date Deposited: 23 Jun 2023 06:57
Last Modified: 14 Aug 2025 03:32
URI: http://peerreview.go2articles.com/id/eprint/826

Actions (login required)

View Item
View Item